Guiding Template-Induced Design Challenges in DSA-MP Lithography

Shao-Yun Fang, Kuo-Hao Wu. Guiding Template-Induced Design Challenges in DSA-MP Lithography. In 2018 IEEE Computer Society Annual Symposium on VLSI, ISVLSI 2018, Hong Kong, China, July 8-11, 2018. pages 500-502, IEEE Computer Society, 2018. [doi]

@inproceedings{FangW18-1,
  title = {Guiding Template-Induced Design Challenges in DSA-MP Lithography},
  author = {Shao-Yun Fang and Kuo-Hao Wu},
  year = {2018},
  doi = {10.1109/ISVLSI.2018.00097},
  url = {http://doi.ieeecomputersociety.org/10.1109/ISVLSI.2018.00097},
  researchr = {https://researchr.org/publication/FangW18-1},
  cites = {0},
  citedby = {0},
  pages = {500-502},
  booktitle = {2018 IEEE Computer Society Annual Symposium on VLSI, ISVLSI 2018, Hong Kong, China, July 8-11, 2018},
  publisher = {IEEE Computer Society},
  isbn = {978-1-5386-7099-6},
}