Robert C. Frye, Kevin D. Cummings, Edward A. Rietman. Proximity Effect Corrections in Electron Beam Lithography. In Richard Lippmann, John E. Moody, David S. Touretzky, editors, Advances in Neural Information Processing Systems 3, [NIPS Conference, Denver, Colorado, USA, November 26-29, 1990]. pages 443-449, Morgan Kaufmann, 1990. [doi]
Abstract is missing.