Polysilicon oxide quality optimization at Wafer level of a Bipolar/CMOS/DMOS technology

Xavier Gagnard, Yannick Rey-Tauriac, Olivier Bonnaud. Polysilicon oxide quality optimization at Wafer level of a Bipolar/CMOS/DMOS technology. Microelectronics Reliability, 41(9-10):1335-1340, 2001.

@article{GagnardRB01,
  title = {Polysilicon oxide quality optimization at Wafer level of a Bipolar/CMOS/DMOS technology},
  author = {Xavier Gagnard and Yannick Rey-Tauriac and Olivier Bonnaud},
  year = {2001},
  tags = {optimization},
  researchr = {https://researchr.org/publication/GagnardRB01},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {41},
  number = {9-10},
  pages = {1335-1340},
}