Fabrication of superhydrophobic wide-band "Black Silicon" by deep reactive ion etching

Tian-Le Gao, Xiao-Sheng Zhang, Guang-Yi Sun, Haixia Zhang. Fabrication of superhydrophobic wide-band "Black Silicon" by deep reactive ion etching. In 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, February 20-23, 2011. pages 209-212, IEEE, 2011. [doi]

Abstract

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