Jiabei Ge, Changhao Yan, Hai Zhou, Dian Zhou, Xuan Zeng. An efficient algorithm for stencil planning and optimization in E-beam lithography. In 22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017, Chiba, Japan, January 16-19, 2017. pages 366-371, IEEE, 2017. [doi]
@inproceedings{GeYZZZ17,
title = {An efficient algorithm for stencil planning and optimization in E-beam lithography},
author = {Jiabei Ge and Changhao Yan and Hai Zhou and Dian Zhou and Xuan Zeng},
year = {2017},
doi = {10.1109/ASPDAC.2017.7858350},
url = {http://dx.doi.org/10.1109/ASPDAC.2017.7858350},
researchr = {https://researchr.org/publication/GeYZZZ17},
cites = {0},
citedby = {0},
pages = {366-371},
booktitle = {22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017, Chiba, Japan, January 16-19, 2017},
publisher = {IEEE},
isbn = {978-1-5090-1558-0},
}