Jiabei Ge, Changhao Yan, Hai Zhou, Dian Zhou, Xuan Zeng. An efficient algorithm for stencil planning and optimization in E-beam lithography. In 22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017, Chiba, Japan, January 16-19, 2017. pages 366-371, IEEE, 2017. [doi]
@inproceedings{GeYZZZ17, title = {An efficient algorithm for stencil planning and optimization in E-beam lithography}, author = {Jiabei Ge and Changhao Yan and Hai Zhou and Dian Zhou and Xuan Zeng}, year = {2017}, doi = {10.1109/ASPDAC.2017.7858350}, url = {http://dx.doi.org/10.1109/ASPDAC.2017.7858350}, researchr = {https://researchr.org/publication/GeYZZZ17}, cites = {0}, citedby = {0}, pages = {366-371}, booktitle = {22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017, Chiba, Japan, January 16-19, 2017}, publisher = {IEEE}, isbn = {978-1-5090-1558-0}, }