An efficient algorithm for stencil planning and optimization in E-beam lithography

Jiabei Ge, Changhao Yan, Hai Zhou, Dian Zhou, Xuan Zeng. An efficient algorithm for stencil planning and optimization in E-beam lithography. In 22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017, Chiba, Japan, January 16-19, 2017. pages 366-371, IEEE, 2017. [doi]

Abstract

Abstract is missing.