Implanted Source/Drain Junctions for Polysilicon Gate Technologies

H. J. Geipel, R. B. Shasteen. Implanted Source/Drain Junctions for Polysilicon Gate Technologies. IBM Journal of Research and Development, 24(3):362-369, 1980. [doi]

Authors

H. J. Geipel

This author has not been identified. Look up 'H. J. Geipel' in Google

R. B. Shasteen

This author has not been identified. Look up 'R. B. Shasteen' in Google