Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application

Zhen Geng, Zheng Shi, Xiaolang Yan, Kai-sheng Luo, Weiwei Pan. Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application. J. Comput. Sci. Technol., 30(3):629-638, 2015. [doi]

Abstract

Abstract is missing.