Tobias Gentner, Johannes Breitenbach, Timon Neitzel, Jacob Schulze, Ricardo Buettner. A Systematic Literature Review of Machine Learning Applications for Process Monitoring and Control in Semiconductor Manufacturing. In Hong Va Leong, Sahra Sedigh Sarvestani, Yuuichi Teranishi, Alfredo Cuzzocrea, Hiroki Kashiwazaki, Dave Towey, Ji-Jiang Yang, Hossain Shahriar, editors, 46th IEEE Annual Computers, Software, and Applications Conferenc, COMPSAC 2022, Los Alamitos, CA, USA, June 27 - July 1, 2022. pages 1081-1086, IEEE, 2022. [doi]
@inproceedings{GentnerBNSB22,
title = {A Systematic Literature Review of Machine Learning Applications for Process Monitoring and Control in Semiconductor Manufacturing},
author = {Tobias Gentner and Johannes Breitenbach and Timon Neitzel and Jacob Schulze and Ricardo Buettner},
year = {2022},
doi = {10.1109/COMPSAC54236.2022.00169},
url = {https://doi.org/10.1109/COMPSAC54236.2022.00169},
researchr = {https://researchr.org/publication/GentnerBNSB22},
cites = {0},
citedby = {0},
pages = {1081-1086},
booktitle = {46th IEEE Annual Computers, Software, and Applications Conferenc, COMPSAC 2022, Los Alamitos, CA, USA, June 27 - July 1, 2022},
editor = {Hong Va Leong and Sahra Sedigh Sarvestani and Yuuichi Teranishi and Alfredo Cuzzocrea and Hiroki Kashiwazaki and Dave Towey and Ji-Jiang Yang and Hossain Shahriar},
publisher = {IEEE},
isbn = {978-1-6654-8810-5},
}