G. Ghidini, C. Capolupo, G. Giusto, A. Sebastiani, B. Stragliati, M. Vitali. Tunnel oxide degradation under pulsed stress. Microelectronics Reliability, 45(9-11):1337-1342, 2005. [doi]
@article{GhidiniCGSSV05,
title = {Tunnel oxide degradation under pulsed stress},
author = {G. Ghidini and C. Capolupo and G. Giusto and A. Sebastiani and B. Stragliati and M. Vitali},
year = {2005},
doi = {10.1016/j.microrel.2005.07.017},
url = {http://dx.doi.org/10.1016/j.microrel.2005.07.017},
tags = {C++},
researchr = {https://researchr.org/publication/GhidiniCGSSV05},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {45},
number = {9-11},
pages = {1337-1342},
}