2.7 A coefficient-error-robust FFE TX with 230% eye-variation improvement without calibration in 65nm CMOS technology

Seungho Han, Sooeun Lee, Minsoo Choi, Jae-Yoon Sim, Hong June Park, Byungsub Kim. 2.7 A coefficient-error-robust FFE TX with 230% eye-variation improvement without calibration in 65nm CMOS technology. In 2014 IEEE International Conference on Solid-State Circuits Conference, ISSCC 2014, Digest of Technical Papers, San Francisco, CA, USA, February 9-13, 2014. pages 50-51, IEEE, 2014. [doi]

@inproceedings{HanLCSPK14,
  title = {2.7 A coefficient-error-robust FFE TX with 230% eye-variation improvement without calibration in 65nm CMOS technology},
  author = {Seungho Han and Sooeun Lee and Minsoo Choi and Jae-Yoon Sim and Hong June Park and Byungsub Kim},
  year = {2014},
  doi = {10.1109/ISSCC.2014.6757333},
  url = {https://doi.org/10.1109/ISSCC.2014.6757333},
  researchr = {https://researchr.org/publication/HanLCSPK14},
  cites = {0},
  citedby = {0},
  pages = {50-51},
  booktitle = {2014 IEEE International Conference on Solid-State Circuits Conference, ISSCC 2014, Digest of Technical Papers, San Francisco, CA, USA, February 9-13, 2014},
  publisher = {IEEE},
  isbn = {978-1-4799-0918-6},
}