Multiscale Modelling of Metal-Organic Chemical Vapour Deposition (MOCVD) Process for GaAs growth

Hrishi Viral Harsora, Soham Sinha, Tarun Kumar Agarwal. Multiscale Modelling of Metal-Organic Chemical Vapour Deposition (MOCVD) Process for GaAs growth. In 32nd IEEE International Conference on High Performance Computing, Data and Analytics, HiPC 2025 - Workshop, Hyderabad, India, December 17-20, 2025. pages 143-144, IEEE, 2025. [doi]

Abstract

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