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Optimization of SiN::X::: H films deposited by PECVD for reliability of electronic, microsystems and optical applications

E. Herth, B. Legrand, L. Buchaillot, N. Rolland, T. Lasri. Optimization of SiN::X::: H films deposited by PECVD for reliability of electronic, microsystems and optical applications. Microelectronics Reliability, 50(8):1103-1106, 2010. [doi]

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