Robust test pattern generation for hold-time faults in nanometer technologies

Yu-Hao Ho, Yo-Wei Chen, Chih-Ming Chang, Kai-Chieh Yang, James Chien-Mo Li. Robust test pattern generation for hold-time faults in nanometer technologies. In 2017 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2017, Hsinchu, Taiwan, April 24-27, 2017. pages 1-4, IEEE, 2017. [doi]

@inproceedings{HoCCYL17,
  title = {Robust test pattern generation for hold-time faults in nanometer technologies},
  author = {Yu-Hao Ho and Yo-Wei Chen and Chih-Ming Chang and Kai-Chieh Yang and James Chien-Mo Li},
  year = {2017},
  doi = {10.1109/VLSI-DAT.2017.7939647},
  url = {https://doi.org/10.1109/VLSI-DAT.2017.7939647},
  researchr = {https://researchr.org/publication/HoCCYL17},
  cites = {0},
  citedby = {0},
  pages = {1-4},
  booktitle = {2017 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2017, Hsinchu, Taiwan, April 24-27, 2017},
  publisher = {IEEE},
  isbn = {978-1-5090-3969-2},
}