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Comparison of deposition models for a TEOS LPCVD process

Stefan Holzer, Alireza Sheikholeslami, Markus Karner, Tibor Grasser, Siegfried Selberherr. Comparison of deposition models for a TEOS LPCVD process. Microelectronics Reliability, 47(4-5):623-625, 2007. [doi]

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Stefan Holzer

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Alireza Sheikholeslami

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Markus Karner

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Tibor Grasser

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Siegfried Selberherr

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