Analysis of the gate capacitance measurement technique and its application for the evaluation of hot-carrier degradation in submicrometer MOSFETs

C. T. Hsu, M. M. Lau, Y. T. Yeow. Analysis of the gate capacitance measurement technique and its application for the evaluation of hot-carrier degradation in submicrometer MOSFETs. Microelectronics Reliability, 41(2):201-209, 2001. [doi]

Abstract

Abstract is missing.