Mechanical Band Gap Formation in Anisotropic CMOS Back-End-of-Line Stacks for Monolithic High-Q MEMS Resonator Confinement

Richard Hudeczek, Peter Baumgartner 0005. Mechanical Band Gap Formation in Anisotropic CMOS Back-End-of-Line Stacks for Monolithic High-Q MEMS Resonator Confinement. In 51st IEEE European Solid-State Device Research Conference, ESSDERC 2021, Grenoble, France, September 13-22, 2021. pages 211-214, IEEE, 2021. [doi]

@inproceedings{HudeczekB21,
  title = {Mechanical Band Gap Formation in Anisotropic CMOS Back-End-of-Line Stacks for Monolithic High-Q MEMS Resonator Confinement},
  author = {Richard Hudeczek and Peter Baumgartner 0005},
  year = {2021},
  doi = {10.1109/ESSDERC53440.2021.9631769},
  url = {https://doi.org/10.1109/ESSDERC53440.2021.9631769},
  researchr = {https://researchr.org/publication/HudeczekB21},
  cites = {0},
  citedby = {0},
  pages = {211-214},
  booktitle = {51st IEEE European Solid-State Device Research Conference, ESSDERC 2021, Grenoble, France, September 13-22, 2021},
  publisher = {IEEE},
  isbn = {978-1-6654-3748-6},
}