Selective Use of Stitch-Induced Via for V0 Mask Reduction: Standard Cell Design and Placement Optimization

Daijoon Hyun, Younggwang Jung, Youngsoo Shin. Selective Use of Stitch-Induced Via for V0 Mask Reduction: Standard Cell Design and Placement Optimization. IEICE Transactions, 102-A(12):1711-1719, 2019. [doi]

Abstract

Abstract is missing.