Robust autotuning MPC for a class of process control applications

Clara M. Ionescu, Dana Copot, Anca Maxim, Eva-Henrietta Dulf, Roxana Both, Robin De Keyser. Robust autotuning MPC for a class of process control applications. In IEEE International Conference on Automation, Quality and Testing, Robotics, AQTR 2016, Cluj-Napoca, Romania, May 19-21, 2016. pages 1-6, IEEE, 2016. [doi]

Abstract

Abstract is missing.