Kiyoshi Ishii, Yoshifumi Saitou, Kengo Furutani, Hiroshi Sakuma, Yoshito Ikeda. Estimation of Optimum Ion Energy for the Reduction of Resistivity in Bias Sputtering of ITO Thin Films. IEICE Transactions, 91-C(10):1653-1657, 2008. [doi]
Abstract is missing.