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Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing

Young-Seon Jeong, Byungwhan Kim, Young-Don Ko. Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing. Expert Syst. Appl., 40(14):5688-5693, 2013. [doi]

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