Linke Jian, Bernd Loechel, Heinz-Ulrich Scheunemann, Martin Bednarzik, Yohannes M. Desta, Jost Goettert. Fabrication of Ultra Thick, Ultra High Aspect Ratio Microcomponents by Deep and Ultra Deep X-Ray Lithography. In 2003 International Conference on MEMS, NANO, and Smart Systems (ICMENS 2003), 20-23 July 2003, Banff, Alberta, Canada. pages 10-14, IEEE Computer Society, 2003. [doi]
Abstract is missing.