Chunxia Jiang, Rongbin Li, Xin Wang, Hailong Shang, Yong Zhang 0003, Peter K. Liaw. Diffusion Barrier Performance of AlCrTaTiZr/AlCrTaTiZr-N High-Entropy Alloy Films for Cu/Si Connect System. Entropy, 22(2):234, 2020. [doi]
@article{JiangLWSZL20,
title = {Diffusion Barrier Performance of AlCrTaTiZr/AlCrTaTiZr-N High-Entropy Alloy Films for Cu/Si Connect System},
author = {Chunxia Jiang and Rongbin Li and Xin Wang and Hailong Shang and Yong Zhang 0003 and Peter K. Liaw},
year = {2020},
doi = {10.3390/e22020234},
url = {https://doi.org/10.3390/e22020234},
researchr = {https://researchr.org/publication/JiangLWSZL20},
cites = {0},
citedby = {0},
journal = {Entropy},
volume = {22},
number = {2},
pages = {234},
}