Vivek Joshi, Kanak Agarwal, Dennis Sylvester. Design-patterning co-optimization of SRAM robustness for double patterning lithography. In Proceedings of the 17th Asia and South Pacific Design Automation Conference, ASP-DAC 2012, Sydney, Australia, January 30 - February 2, 2012. pages 713-718, IEEE, 2012. [doi]
Abstract is missing.