Takeshi Kadono, Ryo Hirose, Ayumi Onaka-Masada, Koji Kobayashi, Akihiro Suzuki, Ryosuke Okuyama, Yoshihiro Koga, Atsuhiko Fukuyama, Kazunari Kurita. Reduction of White Spot Defects in CMOS Image Sensors Fabricated Using Epitaxial Silicon Wafer with Proximity Gettering Sinks by CH2P Molecular Ion Implantation. Sensors, 22(21):8258, 2022. [doi]
Abstract is missing.