EUV-CDA: Pattern shift aware critical density analysis for EUV mask layouts - researchr publication authors

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Abde Ali Kagalwalla, Michale Lam, Kostas Adam, Puneet Gupta. EUV-CDA: Pattern shift aware critical density analysis for EUV mask layouts. In 19th Asia and South Pacific Design Automation Conference, ASP-DAC 2014, Singapore, January 20-23, 2014. pages 155-160, IEEE, 2014. [doi]

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