Satoru Kaneko, Takeshi Ito, Manabu Yasui, Masahito Kurouchi, Hironori Torii, Takao Amazawa, Takashi Tikumasu, Takatoshi Nagano, Lee Seughwan, Sungkyun Park, Hirofumi Takikawa. Properties of epitaxial AlN thin film deposited on sapphire substrate by ECR plasma. In 2013 6th IEEE/International Conference on Advanced Infocomm Technology, ICAIT 2013, Hsinchu, Taiwan, July 6-9, 2013. pages 69-70, IEEE, 2013. [doi]
Abstract is missing.