Wei Kang, Ziqiang John Mao. An adaptive model for the control of critical dimension in photolithography process. In 45th IEEE Conference on Decision and Control, CDC 2006, San Diego, CA, USA, 13-15 December, 2006. pages 4231-4236, IEEE, 2004. [doi]
@inproceedings{KangM04-0,
title = {An adaptive model for the control of critical dimension in photolithography process},
author = {Wei Kang and Ziqiang John Mao},
year = {2004},
doi = {10.1109/CDC.2004.1429416},
url = {https://doi.org/10.1109/CDC.2004.1429416},
researchr = {https://researchr.org/publication/KangM04-0},
cites = {0},
citedby = {0},
pages = {4231-4236},
booktitle = {45th IEEE Conference on Decision and Control, CDC 2006, San Diego, CA, USA, 13-15 December, 2006},
publisher = {IEEE},
}