Adaptive modeling and H/sub /spl infin// control for photolithography manufacturing process - researchr publication authors

researchr

You are not signed in
Sign in
Sign up

Wei Kang, Ziqiang John Mao. Adaptive modeling and H/sub /spl infin// control for photolithography manufacturing process. In Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004. pages 1392-1393, IEEE, 2004. [doi]

This author has not been identified. Look up 'Wei Kang' in GoogleThis author has not been identified. Look up 'Ziqiang John Mao' in Google

runs on WebDSL