Wei Kang, Ziqiang John Mao. Adaptive modeling and H/sub /spl infin// control for photolithography manufacturing process. In Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004. pages 1392-1393, IEEE, 2004. [doi]
@inproceedings{KangM04-1, title = {Adaptive modeling and H/sub /spl infin// control for photolithography manufacturing process}, author = {Wei Kang and Ziqiang John Mao}, year = {2004}, doi = {10.23919/ACC.2004.1386769}, url = {https://doi.org/10.23919/ACC.2004.1386769}, researchr = {https://researchr.org/publication/KangM04-1}, cites = {0}, citedby = {0}, pages = {1392-1393}, booktitle = {Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004}, publisher = {IEEE}, isbn = {0-7803-8335-4}, }