Kai-Chieh Kao, Chi Jia Huang, Chang-Sian Wu, Yi-Lung Cheng. Electrical and reliability performance of atomic layer deposition HfO2 capping layer on porous low dielectric constant materials. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 1, IEEE, 2015. [doi]
Abstract is missing.