Amrit Mohan Kaushik, Raghava Mutharaju. An Ontology Design Pattern for Modeling Bias. In Eva Blomqvist, Torsten Hahmann, Karl Hammar, Pascal Hitzler, Rinke Hoekstra, Raghava Mutharaju, María Poveda-Villalón, Cogan Shimizu, Martin G. Skjæveland, Monika Solanki, Vojtech Svátek, Lu Zhou, editors, Advances in Pattern-Based Ontology Engineering, extended versions of the papers published at the Workshop on Ontology Design and Patterns (WOP). Volume 51 of Studies on the Semantic Web, pages 337-348, IOS Press, 2021. [doi]
@inproceedings{KaushikM21,
title = {An Ontology Design Pattern for Modeling Bias},
author = {Amrit Mohan Kaushik and Raghava Mutharaju},
year = {2021},
doi = {10.3233/SSW210024},
url = {https://doi.org/10.3233/SSW210024},
researchr = {https://researchr.org/publication/KaushikM21},
cites = {0},
citedby = {0},
pages = {337-348},
booktitle = {Advances in Pattern-Based Ontology Engineering, extended versions of the papers published at the Workshop on Ontology Design and Patterns (WOP)},
editor = {Eva Blomqvist and Torsten Hahmann and Karl Hammar and Pascal Hitzler and Rinke Hoekstra and Raghava Mutharaju and María Poveda-Villalón and Cogan Shimizu and Martin G. Skjæveland and Monika Solanki and Vojtech Svátek and Lu Zhou},
volume = {51},
series = {Studies on the Semantic Web},
publisher = {IOS Press},
isbn = {978-1-64368-175-7},
}