A run-to-run controller for a chemical mechanical planarization process using least squares generative adversarial networks

Sinyoung Kim, Jaeyeon Jang, Chang Ouk Kim. A run-to-run controller for a chemical mechanical planarization process using least squares generative adversarial networks. J. Intelligent Manufacturing, 32(8):2267-2280, 2021. [doi]

Abstract

Abstract is missing.