Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment

Byungwhan Kim, Jeong Kim, Seongjin Choi. Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment. Expert Syst. Appl., 36(8):11347-11351, 2009. [doi]

Abstract

Abstract is missing.