Impact of FinFET technology for power gating in nano-scale design

Keunwoo Kim, Rouwaida Kanj, Rajiv V. Joshi. Impact of FinFET technology for power gating in nano-scale design. In Fifteenth International Symposium on Quality Electronic Design, ISQED 2014, Santa Clara, CA, USA, March 3-5, 2014. pages 543-547, IEEE, 2014. [doi]

Authors

Keunwoo Kim

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Rouwaida Kanj

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Rajiv V. Joshi

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