Impact of the collector region fabrication on electrical characteristics of HCBT structures in 180 nm BiCMOS technology

Marko Koricic, Tomislav Suligoj, Hidenori Mochizuki, So-ichi Morita, Katsumi Shinomura, Hisaya Imai. Impact of the collector region fabrication on electrical characteristics of HCBT structures in 180 nm BiCMOS technology. In MIPRO, 2011 Proceedings of the 34th International Convention, Opatija, Croatia, 23-27 May, 2011. pages 39-43, IEEE, 2011. [doi]

Abstract

Abstract is missing.