Probabilistic Compositional Active Basis Models for Robust Pattern Recognition

Adam Kortylewski, Thomas Vetter. Probabilistic Compositional Active Basis Models for Robust Pattern Recognition. In Richard C. Wilson, Edwin R. Hancock, William A. P. Smith, editors, Proceedings of the British Machine Vision Conference 2016, BMVC 2016, York, UK, September 19-22, 2016. BMVA Press, 2016. [doi]

Abstract

Abstract is missing.