A High-Density Metal-Fuse Technology Featuring a 1.6 V Programmable Low-Voltage Bit Cell With Integrated 1 V Charge Pumps in 22 nm Tri-Gate CMOS

Sarvesh H. Kulkarni, Zhanping Chen, Balaji Srinivasan, M. Brian Pedersen, Uddalak Bhattacharya, Kevin Zhang. A High-Density Metal-Fuse Technology Featuring a 1.6 V Programmable Low-Voltage Bit Cell With Integrated 1 V Charge Pumps in 22 nm Tri-Gate CMOS. J. Solid-State Circuits, 51(4):1003-1008, 2016. [doi]

@article{KulkarniCSPBZ16,
  title = {A High-Density Metal-Fuse Technology Featuring a 1.6 V Programmable Low-Voltage Bit Cell With Integrated 1 V Charge Pumps in 22 nm Tri-Gate CMOS},
  author = {Sarvesh H. Kulkarni and Zhanping Chen and Balaji Srinivasan and M. Brian Pedersen and Uddalak Bhattacharya and Kevin Zhang},
  year = {2016},
  doi = {10.1109/JSSC.2015.2507786},
  url = {http://dx.doi.org/10.1109/JSSC.2015.2507786},
  researchr = {https://researchr.org/publication/KulkarniCSPBZ16},
  cites = {0},
  citedby = {0},
  journal = {J. Solid-State Circuits},
  volume = {51},
  number = {4},
  pages = {1003-1008},
}