Reverse short-channel effect due to lateral diffusion of point-defect induced by source/drain ion implantation - researchr publication authors

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Tatsuya Kunikiyo, Katsuyoshi Mitsui, Masato Fujinaga, Tetsuya Uchida, Norihiko Kotani. Reverse short-channel effect due to lateral diffusion of point-defect induced by source/drain ion implantation. IEEE Trans. on CAD of Integrated Circuits and Systems, 13(4):507-514, 1994. [doi]

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