Control ability of spin coating planarization of resist filmand optimal control of developers

Yang-Kuao Kuo, Chuen-Guang Chao. Control ability of spin coating planarization of resist filmand optimal control of developers. Microelectronics Journal, 37(8):759-764, 2006. [doi]

@article{KuoC06,
  title = {Control ability of spin coating planarization of resist filmand optimal control of developers},
  author = {Yang-Kuao Kuo and Chuen-Guang Chao},
  year = {2006},
  doi = {10.1016/j.mejo.2005.10.009},
  url = {http://dx.doi.org/10.1016/j.mejo.2005.10.009},
  researchr = {https://researchr.org/publication/KuoC06},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Journal},
  volume = {37},
  number = {8},
  pages = {759-764},
}