Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization - researchr publication authors

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Masaki Kuramochi, Yukihide Kohira, Hiroyoshi Tanabe, Tetsuaki Matsunawa, Chikaaki Kodama. Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization. IEEE Access, 12:58490-58501, 2024. [doi]

This author has not been identified. Look up 'Masaki Kuramochi' in GoogleThis author has not been identified. Look up 'Yukihide Kohira' in GoogleThis author has not been identified. Look up 'Hiroyoshi Tanabe' in GoogleThis author has not been identified. Look up 'Tetsuaki Matsunawa' in GoogleThis author has not been identified. Look up 'Chikaaki Kodama' in Google

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