Masaki Kuramochi, Yukihide Kohira, Hiroyoshi Tanabe, Tetsuaki Matsunawa, Chikaaki Kodama. Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization. IEEE Access, 12:58490-58501, 2024. [doi]
@article{KuramochiKTMK24,
title = {Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization},
author = {Masaki Kuramochi and Yukihide Kohira and Hiroyoshi Tanabe and Tetsuaki Matsunawa and Chikaaki Kodama},
year = {2024},
doi = {10.1109/ACCESS.2024.3390936},
url = {https://doi.org/10.1109/ACCESS.2024.3390936},
researchr = {https://researchr.org/publication/KuramochiKTMK24},
cites = {0},
citedby = {0},
journal = {IEEE Access},
volume = {12},
pages = {58490-58501},
}