Ohyung Kwon, Nayeon Lee, Kangil Kim. Effect of pre-training to build a regression model using shallow neural network for semiconductor plasma etch process equipment. In Xintao Wu, Chris Jermaine, Li Xiong 0001, Xiaohua Hu 0001, Olivera Kotevska, Siyuan Lu, Weija Xu, Srinivas Aluru, ChengXiang Zhai, Eyhab Al-Masri, Zhiyuan Chen 0003, Jeff Saltz 0001, editors, IEEE International Conference on Big Data, Big Data 2020, Atlanta, GA, USA, December 10-13, 2020. pages 2903-2906, IEEE, 2020. [doi]
Abstract is missing.