Improvement of Retention Characteristics Using Doped SiN Layer Between WL Spaces in 3D NAND Flash

Hyewon Kyung, Yunejae Suh, Youngho Jung, Daewoong Kang. Improvement of Retention Characteristics Using Doped SiN Layer Between WL Spaces in 3D NAND Flash. IEEE Access, 12:45112-45117, 2024. [doi]

@article{KyungSJK24,
  title = {Improvement of Retention Characteristics Using Doped SiN Layer Between WL Spaces in 3D NAND Flash},
  author = {Hyewon Kyung and Yunejae Suh and Youngho Jung and Daewoong Kang},
  year = {2024},
  doi = {10.1109/ACCESS.2024.3381525},
  url = {https://doi.org/10.1109/ACCESS.2024.3381525},
  researchr = {https://researchr.org/publication/KyungSJK24},
  cites = {0},
  citedby = {0},
  journal = {IEEE Access},
  volume = {12},
  pages = {45112-45117},
}