Micromachined high-Q inductors in a 0.18-/spl mu/m copper interconnect low-k dielectric CMOS process - researchr publication authors

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Hasnain Lakdawala, Xu Zhu, Hao Luo, Suresh Santhanam, L. Richard Carley, Gary K. Fedder. Micromachined high-Q inductors in a 0.18-/spl mu/m copper interconnect low-k dielectric CMOS process. J. Solid-State Circuits, 37(3):394-403, 2002. [doi]

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