A study of the linearity between I::on:: and log I::off:: of modern MOS transistors and its application to stress engineering

W. S. Lau, Peizhen Yang, C. W. Eng, V. Ho, C. H. Loh, S. Y. Siah, D. Vigar, L. Chan. A study of the linearity between I::on:: and log I::off:: of modern MOS transistors and its application to stress engineering. Microelectronics Reliability, 48(4):497-503, 2008. [doi]

Abstract

Abstract is missing.