Investigation on the Effects of Interconnect RC in 3nm Technology Node Using Path-Finding Process Design Kit - researchr publication authors

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Yeji Lee, Wonyeong Jang, Kyungbae Kwon, Jihun Park, Changhyun Yoo, Jeesoo Chang, Jongwook Jeon. Investigation on the Effects of Interconnect RC in 3nm Technology Node Using Path-Finding Process Design Kit. IEEE Access, 10:80695-80702, 2022. [doi]

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