Enhanced dual quaternion skinning for production use

Gene S. Lee, Andy Lin, Matt Schiller, Scott Peters, Mark McLaughlin, Frank Hanner. Enhanced dual quaternion skinning for production use. In International Conference on Computer Graphics and Interactive Techniques, SIGGRAPH 2013, Anaheim, CA, USA, July 21-25, 2013, Talks Proceedings. pages 9, ACM, 2013. [doi]

Abstract

Abstract is missing.