Techology trend of edge AI

Yen-Lin Lee, Pei-Kuei Tsung, Max Wu. Techology trend of edge AI. In 2018 International Symposium on VLSI Design, Automation and Test (VLSI-DAT), Hsinchu, Taiwan, April 16-19, 2018. pages 1-2, IEEE, 2018. [doi]

Authors

Yen-Lin Lee

This author has not been identified. Look up 'Yen-Lin Lee' in Google

Pei-Kuei Tsung

This author has not been identified. Look up 'Pei-Kuei Tsung' in Google

Max Wu

This author has not been identified. Look up 'Max Wu' in Google