An Intelligent System to Monitor the Chemical Concentration of Electroplating Process: An Integrated OLAP and Fuzzy Logic Approach

R. W. K. Leung, Henry C. W. Lau, C. K. Kwong. An Intelligent System to Monitor the Chemical Concentration of Electroplating Process: An Integrated OLAP and Fuzzy Logic Approach. Artif. Intell. Rev., 21(2):139-159, 2004. [doi]

Authors

R. W. K. Leung

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Henry C. W. Lau

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C. K. Kwong

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